- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; materials therefor; originals therefor; apparatus specially adapted therefor
- G03F 9/02 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically combined with means for automatic focusing
Patent holdings for IPC class G03F 9/02
Total number of patents in this class: 15
10-year publication summary
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2
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0
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1
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2
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0
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1
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1
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0
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0
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0
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| 2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Nikon Corporation | 7162 |
6 |
| FUJIFILM Corporation | 27102 |
1 |
| Cymer, LLC | 347 |
1 |
| ASML Netherlands B.V. | 6816 |
1 |
| Fujikura Ltd. | 2777 |
1 |
| Northwestern University | 3112 |
1 |
| Intevac, Inc. | 127 |
1 |
| Screen Holdings Co., Ltd. | 2431 |
1 |
| Shanghai Micro Electronics Equipment Co., Ltd. | 56 |
1 |
| Shanghai Micro Electronics Equipment (Group) Co., Ltd. | 243 |
1 |
| Other owners | 0 |